Electron-Beam Assisted Etching System


Main Facilities

● Electron-Beam Assisted Nanoprocess System
● Computer System for Nanostructure Design
● Surface Analysis System
● Electron-Beam Assisted Epitaxy System
● Photolithography System
● ECR Sputtering System
● Reactive Ion Etching System
● Anger Microanalysis System

ECR Sputtering System


Scanning Probe Microscope

Related Facilities

● Electron-Beam Assisted Etching System
● X-ray Diffraction System
● Scanning Electron Microscope
● Scanning Probe Microscope
● Femtosecond Laser System
● Q-Switched YAG Laser System
● Micro-Photoluminescence System
● Organometallic Vapor Phase Epitaxy System
● Sputtering System


Utilities

● Clean Room (220 m2)
● Nanoprocess Room: Class 1,000
● Frontier Device Room: Class 10,000
● Ultrapure Water:>18 MΩ
● Chiller: Heat Pump
● Gas Supply: H2, O2, Ar, He, N2, Air, Liq. N2
● Fire Extinguisher, Fireplug, Alarm System
● CAD Room

Reactive Ion Etching System


Architectural design of facilities

Lecturing Environment